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Avantes Inc metal oxide semiconductor cmos detector
Metal Oxide Semiconductor Cmos Detector, supplied by Avantes Inc, used in various techniques. Bioz Stars score: 86/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/metal+oxide+semiconductor+cmos+detector/pm42095509-49-21-14?v=Avantes+Inc
Average 86 stars, based on 1 article reviews
metal oxide semiconductor cmos detector - by Bioz Stars, 2026-07
86/100 stars

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Fabrication of the hyperbolic metalens and the imaging setup. (a) Schematic of the hexagonal unit cell of the metalens with a lattice constant of a = 350 nm, consisting of cylindrical nanopillars with a height of H = 500 nm and diameters, D , ranging from 140 nm to 264 nm. (b) Optical image of a wafer with an array of metalenses patterned using deep UV immersion photolithography. (c, d) Scanning electron micrographs of the metalens depicting the patterned a-Si nanopillars on a glass substrate. (e) The simulated phase and transmittance of uniform a-Si nanopillar arrays with height of 500 nm and diameters ranging from 140 to 264 nm with a step size of 2 nm. (f) Optical image of the fabricated 5 mm diameter metalens. (g) Optical image of the hyperbolic metalens camera used in imaging, where the (h) metalens (white circle) is mounted directly in front of the <t>CMOS</t> detector (red square).
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Fabrication of the hyperbolic metalens and the imaging setup. (a) Schematic of the hexagonal unit cell of the metalens with a lattice constant of a = 350 nm, consisting of cylindrical nanopillars with a height of H = 500 nm and diameters, D , ranging from 140 nm to 264 nm. (b) Optical image of a wafer with an array of metalenses patterned using deep UV immersion photolithography. (c, d) Scanning electron micrographs of the metalens depicting the patterned a-Si nanopillars on a glass substrate. (e) The simulated phase and transmittance of uniform a-Si nanopillar arrays with height of 500 nm and diameters ranging from 140 to 264 nm with a step size of 2 nm. (f) Optical image of the fabricated 5 mm diameter metalens. (g) Optical image of the hyperbolic metalens camera used in imaging, where the (h) metalens (white circle) is mounted directly in front of the <t>CMOS</t> detector (red square).
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Fabrication of the hyperbolic metalens and the imaging setup. (a) Schematic of the hexagonal unit cell of the metalens with a lattice constant of a = 350 nm, consisting of cylindrical nanopillars with a height of H = 500 nm and diameters, D , ranging from 140 nm to 264 nm. (b) Optical image of a wafer with an array of metalenses patterned using deep UV immersion photolithography. (c, d) Scanning electron micrographs of the metalens depicting the patterned a-Si nanopillars on a glass substrate. (e) The simulated phase and transmittance of uniform a-Si nanopillar arrays with height of 500 nm and diameters ranging from 140 to 264 nm with a step size of 2 nm. (f) Optical image of the fabricated 5 mm diameter metalens. (g) Optical image of the hyperbolic metalens camera used in imaging, where the (h) metalens (white circle) is mounted directly in front of the <t>CMOS</t> detector (red square).
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Fabrication of the hyperbolic metalens and the imaging setup. (a) Schematic of the hexagonal unit cell of the metalens with a lattice constant of a = 350 nm, consisting of cylindrical nanopillars with a height of H = 500 nm and diameters, D , ranging from 140 nm to 264 nm. (b) Optical image of a wafer with an array of metalenses patterned using deep UV immersion photolithography. (c, d) Scanning electron micrographs of the metalens depicting the patterned a-Si nanopillars on a glass substrate. (e) The simulated phase and transmittance of uniform a-Si nanopillar arrays with height of 500 nm and diameters ranging from 140 to 264 nm with a step size of 2 nm. (f) Optical image of the fabricated 5 mm diameter metalens. (g) Optical image of the hyperbolic metalens camera used in imaging, where the (h) metalens (white circle) is mounted directly in front of the CMOS detector (red square).

Journal: Nanophotonics

Article Title: Neural network enabled wide field-of-view imaging with hyperbolic metalenses

doi: 10.1515/nanoph-2025-0354

Figure Lengend Snippet: Fabrication of the hyperbolic metalens and the imaging setup. (a) Schematic of the hexagonal unit cell of the metalens with a lattice constant of a = 350 nm, consisting of cylindrical nanopillars with a height of H = 500 nm and diameters, D , ranging from 140 nm to 264 nm. (b) Optical image of a wafer with an array of metalenses patterned using deep UV immersion photolithography. (c, d) Scanning electron micrographs of the metalens depicting the patterned a-Si nanopillars on a glass substrate. (e) The simulated phase and transmittance of uniform a-Si nanopillar arrays with height of 500 nm and diameters ranging from 140 to 264 nm with a step size of 2 nm. (f) Optical image of the fabricated 5 mm diameter metalens. (g) Optical image of the hyperbolic metalens camera used in imaging, where the (h) metalens (white circle) is mounted directly in front of the CMOS detector (red square).

Article Snippet: The hyperbolic metalens camera comprises only two components ( ): the metalens and a complementary metal oxide semiconductor (CMOS) detector (Thorlabs, Zelux-CS165MU), resulting in an ultra-compact design.

Techniques: Imaging

Characterization of the hyperbolic metalens. (a) Optical setup for angles of incidence dependent optical characterization of the hyperbolic metalens PSFs. The laser (850 nm wavelength) output isexpanded using two lenses and an aperture to distribute the intensity uniformly across the metalens. These are mounted on a rotating arm of a goniometer that enables different AOI illumination on the metalens. The metalens focuses the collimated laser at the focal plane, which is then imaged onto the CMOS detector using an objective lens (Olympus, MPLAPON100X) and a tube lens (150 mm focal distance). (b) (top) Experimentally measured PSFs at different angles of incidence compared to (middle) simulated PSFs for the hyperbolic metalens. We use a log-normalized colormap for better visualization of these PSFs. The scalebars (white) have sizes of 10 µm and 2 µm for the main image and its inset, respectively. (bottom) The horizontal line profiles of the measured (red) and simulated (blue) PSFs.

Journal: Nanophotonics

Article Title: Neural network enabled wide field-of-view imaging with hyperbolic metalenses

doi: 10.1515/nanoph-2025-0354

Figure Lengend Snippet: Characterization of the hyperbolic metalens. (a) Optical setup for angles of incidence dependent optical characterization of the hyperbolic metalens PSFs. The laser (850 nm wavelength) output isexpanded using two lenses and an aperture to distribute the intensity uniformly across the metalens. These are mounted on a rotating arm of a goniometer that enables different AOI illumination on the metalens. The metalens focuses the collimated laser at the focal plane, which is then imaged onto the CMOS detector using an objective lens (Olympus, MPLAPON100X) and a tube lens (150 mm focal distance). (b) (top) Experimentally measured PSFs at different angles of incidence compared to (middle) simulated PSFs for the hyperbolic metalens. We use a log-normalized colormap for better visualization of these PSFs. The scalebars (white) have sizes of 10 µm and 2 µm for the main image and its inset, respectively. (bottom) The horizontal line profiles of the measured (red) and simulated (blue) PSFs.

Article Snippet: The hyperbolic metalens camera comprises only two components ( ): the metalens and a complementary metal oxide semiconductor (CMOS) detector (Thorlabs, Zelux-CS165MU), resulting in an ultra-compact design.

Techniques: